Nano-technique Allows for Refined Patterning
نویسنده
چکیده
Semiconductor International (Aug. 1) -In work at the U. of I., researchers used nanoimprint lithography and carbon nanotubes to replicate features with nanometer dimensions. "We were able to demonstrate reliable patterning at the 2nm scale, and even some capability down to 1nm," said John Rogers, a professor of materials science and engineering at U of I. more... ***** Copyright 2006 Reed Business Information, US, a division of Reed Elsevier Inc. All Rights Reserved
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